UNStudio, ALPOLIC Materials, BAU Germany, Tradeshow Booth 2017, Prismatic, Lumiflon FEVE Resin, Photography Laurian Ghinitoiu

Lumiflon will be presenting at this year's Waterborne Symposium on Wednesday, February 27, 2019 at the Astor Crowne Plaza in New Orleans. Technical Development Chemist, Donald Lawson will be giving a presentation regarding the latest developments in 1K FEVE Blends, specifically improved .

Abstract: Fluoroethylene vinyl ether (FEVE) based topcoats are well known for their extremely long-lasting gloss and exceeding 40 years of service. In this study, we evaluated blends of various acrylic resins to determine if the low water absorption and high against UV degradation of a FEVE-based resin can offer additional corrosive protection when used in a topcoat as a single pack 1K coating formulation. Electrochemical impedance spectroscopy was used along with other accelerated testing methods including cyclic salt fog/UV exposure to evaluate corrosion resistance.

About Donald Lawson: Donald Lawson received his B.S. in chemistry from Illinois State University. With over 38 years of formulation experience in the coatings industry, Mr. Lawson has developed coatings for aerospace, military, and industrial applications. He has written extensive computer software to assist in formulation assessment and development. He is a co-inventor holding a patent on cardanol based dimmers and a past recipient of the Dexter Corporation's exceptional achievement award. Don is currently assigned to the LUMIFLON technical service group of AGCCA, Inc.

Presentation Details:
Waterborne Symposium
Astor Crowne Plaza, New Orleans, Louisiana
FEBRUARY 24 – MARCH 1, 2019

AGC Chemicals America will also be exhibiting at Booth #206

Leave a Reply

Your email address will not be published.

You may use these <abbr title="HyperText Markup Language">HTML</abbr> tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <s> <strike> <strong>

*